Citation: K C Narasimhamurthy and Roy Paily, Semiconductor Science and Technology (2011), 26, 075002.
Summary: Wafer-scale fabrication and characterization of local back gate semiconducting nanotube thin-film transistors (SN-TFTs) are reported in this paper. The local back gate voltage of the corresponding SN-TFT controls the individual transistor switching. In order to achieve high performance, a high-k dielectric material is employed as a gate oxide and this helped to achieve low-voltage operations, much steeper sub-threshold voltage swings and higher transconductance values. A simple procedure to deposit a high-density single-walled carbon nanotube thin film on an amino-silane-treated hafnium oxide (HfOX) surface is suggested such that a good density of nanotubes is realized without degrading the device on–off current ratio and mobility values. The density of the nanotubes achieved on the silanized HfOX surface is about 40–45 nanotubes µm−2. SN-TFTs exhibit an excellent p-type output characteristic with distinct linear and saturation regions. Local back gate SN-TFTs exhibit an on–off current ratio exceeding 104 and a steep sub-threshold slope of 400 mV/decade. SN-TFTs achieve a maximum current density of 13 μA µm−1, an average threshold voltage of −0.5 V, a maximum normalized transconductance of 18.5 μS µm−1 and exhibit a maximum carrier mobility of 60.6 cm2(Vs)−1.